Semiconductor Targets Aluminum Copper Tantalum Titanium Other Powdered Metals Chemical Precursors RuDER® for Ru and RuO2 Tcursor® series: Rudense® for Area Selective Deposition Ts-Ir5 Ts-Co10 Ts-Ti9 Ts-Ta7 Ts-Nb10 Ts-Hf3 Ts-Zr2 SiTBA S SiTBIS TD-50 TG-4E Flat Panel Display and Solar Panel Targets Organic Light Emitting Diode Conflict Minerals Tcursor® series: Ts-Hf3 for HfO2 Characteristics Melting point: <-20°C Vapor pressure: 0.1Torr (77°C) Decomposition temperature: 240°C Thermal CVD with O₂ Step Coverage
