Tcursor® series: Ts-Ir5
Characteristics
- Liquid at r.t. (mp. <25°C)
- Vapor pressure: 0.1Torr (88°C)
- Co-film can be deposited
- Deposited at low temperature
- High deposition rate with NH3
- Excellent selectivity
Thermal Properties
TG curves
DSC curves
Thermal Deposition Properties
Thermal CVD with HCOOH
Deposition time [min]
Step Coverage
By Thermal ALD with NH₂ @225°C