Tcursor® series: Rudense® for Area Selective Deposition
Rudense
Melting point :27°C
Vapor pressure :0.1Torr @76°C
Decomp. temp. :230°C
Viscosity :15cP @65°C
Thermal Properties
Thermal CVD with NH3
Temperature Dependency (on SiO2 sub.)
Step Coverage
Step coverage ~80%(Aspect ratio ~4)
Area Selective Deposition with Non-Oxidative Conditions (CVD Process)
SEM Images
