RuDER® for Ru and RuO2

RuDER

Melting point :17°C
Vapor pressure :0.1Torr @75°C
Decomp. temp. :270°C
Viscosity :7cP @25°C

Thermal Stability (Isothermal TG)

2.-Thermal-Stability--Isothermal-TG-

Thermal CVD with O2

Temperature Dependency (on SiO₂ sub.)

3.-Temperature-Dependency--on-SiO2-sub.-Cycle-Dependency--on-SiO2-sub.-

Arrehenius plot of the growth rate of
Ru films deposited by RuDER

Nucleation Characteristics

4.-Nucleation-Characteristics-update1

Thermal ALD

Cycle Dependency (on SiO₂ sub.)

5.-Cycle-Dependency--on-SiO2-sub.-

J. Electrochem. Soc., 154 (2) D95 (2007)

Improvement of Ru Film Morphology

6.-Improvement-of-Ru-Film-Morphology-update